Semiconductor & Hi-Tech – High Purity Cleaning
How to gain perfect control over your cleaning process, optimize your resource usage and untap the potential of Industry 4.0.
Finnsonic provides Grade IV, II, I or equivalent cleanliness with over 20 years of expertise in high purity component cleaning. We will help you achieve the cleanliness standards you require!
High purity cleaning in semiconductor manufacturing equipment
High purity cleaning is often essential for components used in semiconductor manufacturing equipment and similar high-tech applications.
Applications:
- Lithography (DUV, EUV)
- Inspection
- Deposition
- Electron-beam systems
- Laser systems
- Other system operating under high vacuum (UHV, XHV)
Components:
- Machined components
- Pipe and hose assemblies
- Glass and ceramic components
- Sealing components
Key Requirements for High-Purity Cleaning
- Pre cleaning: removal of machining fluids, particles and elemental contamination
- Precision and final cleaning to Grade IV, II or I standards
- Particle cleanliness down to micron size and smaller.
- Stain free rinsing results with high purity DI water
- Limit values on residual total organic carbon (TOC)
- Limit values on specific elemental impurities (XPS)
- Outgassing limit values and analysis with bake out and RGA
- Cleaning line materials and construction with low outgassing and minimal particle generation to comply with cleanroom classifications e.g. ISO 7, ISO 6, ISO 5, AMC.
Take your component cleaning to the next level with FinnSonic automated solution
Gain perfect control over your process. Reduce deviation to minimum on e.g. treatment times, bath concentrations and temperatures.
Optimize your resource usage. Gain your throughput with a minimal amount of operator hours, detergent, water, energy and maintenance.
Untap the potential of industry 4.0. Leverage process data through FinnSonic digital services.
Comply with HSE requirements. Enjoy intuitive user interfaces, prevent exposure to hazards and gain control over emissions.
Best solution for High-Purity Cleaning by FinnSonic
- Pre cleaning, precision cleaning, final cleaning, Grade IV, II, I.
- Water based ultrasonic cleaning.
- From single stage units to multistage lines, manual or automated.
- FinnSonic Genius ultrasonic technology with automatic frequency and power regulation.
- Range of ultrasonic frequencies including 27, 37, 80, 132 kHz.
- High purity design of tanks, pipelines and ancillary equipment.
- Drying with HEPA filtered hot air and/ or vacuum.
- Basket transfer systems with cleanroom compliance.
- Encapsulation with HEPA laminar flow ceilings and extraction.
- Loading and unloading systems with pass through to cleanroom.
- High purity / cleanroom compliant materials and construction.
- Pure water treatment systems including TOC reduction and ultrafiltration.
- Advanced process control system with intuitive user interfaces.
- Batch reporting and full event and process data logging. Integration with customer factory systems.
Choose the cleaning line from our two options: Finnsonic Versa Genius+ or Optima
FinnSonic Versa Genius+:
- Modular multistage manual or automated ultrasonic cleaning lines.
- Variants for pre cleaning, precision cleaning or final cleaning according to cleanliness grade.
FinnSonic Optima:
- Large format multistage, manual or automated, ultrasonic cleaning lines.
- Variants for pre cleaning, precision cleaning or final cleaning according to cleanliness grade.
- Even bespoke designs to suit individual requirements.
Better process solution?
FinnSonic offers complete process solutions.
The process solutions can be chosen from our standard machines or made precisely for your company’s needs. Let’s discuss more about your cleaning process needs.